In this publication we present a novel setup for the Optical Trap Assisted Nanopatterning
(OTAN) technology. The setup allows process parallelization and thus higher throughput in this inventive and flexible direct-nanopatterning technology. We have determined the stiffness of the optical traps and compared the obtained result with the single beam OTAN parameters. Furthermore we estimate the increase in throughput for the parallelized approach in comparison to the conventional system.
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