S. Takahashi, Y. Horita, F. Kaji, Y. Yamaguchi, M. Michihata, K. Takamasu
A new concept for the laser-assisted removal of material is proposed for achieving nanoscale correction in next-generation functional microstructures such as nanostructured photoresist surfaces and micro 3-D objects fabricated using microstereolithography. This proposed method is characterized by the entrapment of TiO2 photocatalyst nanoparticles by a remotely controlled radiation force, which allows not only for remote processing using the inherent properties of light, but also a fine process resolution that goes beyond the limits of diffraction focusing. Both theoretical and experimental analyses are used to verify the basic feasibility of this proposed concept.
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